<strong><span style="font-size:18px;">基底偏压对磁控溅射TiAlSiN涂层微观结构、力学性能及摩擦学性能的影响</span></strong>

硬质合金 ›› 2020, Vol. 37 ›› Issue (4) : 273-279.

基底偏压对磁控溅射TiAlSiN涂层微观结构、力学性能及摩擦学性能的影响

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Influence of Substrate Bias on Microstructure, Mechanical and Tribological Properties of TiAlSiN Thin Films Deposited by Magnetron Sputtering

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{{article.zuoZheCn_L}}. {{article.title_cn}}. {{journal.qiKanMingCheng_CN}}. 2020, 37(4): 273-279

{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2020, 37(4): 273-279

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